The ICs were made using sophisticated immersion lithography for its 12 critical layers, incorporating the latest technology advancements.
Immersion lithography is a resolution enhancement technique that interposes a liquid medium between the scanner optics and the wafer surface, replacing the traditional air gap.
The optical resolution is enhanced since the immersion fluid, which has a higher refractive index than air, allows using lenses with a higher numerical aperture. The result is more accurate patterns imprinted on the silicon wafer.
UMC makes first 45nm memory chips
Posted on Wednesday, Nov 22 2006 @ 05:26 CET by Thomas De Maesschalck
UMC has successfully manufactured the first 45nm SRAM chips: