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UMC makes first 45nm memory chips

Posted on Wednesday, November 22 2006 @ 05:26:14 CET by


UMC has successfully manufactured the first 45nm SRAM chips:
The ICs were made using sophisticated immersion lithography for its 12 critical layers, incorporating the latest technology advancements.

Immersion lithography is a resolution enhancement technique that interposes a liquid medium between the scanner optics and the wafer surface, replacing the traditional air gap.

The optical resolution is enhanced since the immersion fluid, which has a higher refractive index than air, allows using lenses with a higher numerical aperture. The result is more accurate patterns imprinted on the silicon wafer.




 



 

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