Posted on Tuesday, November 28 2006 @ 14:53 CET by Thomas De Maesschalck
Intel is manufacturing the first samples of its 45nm Penryn processor,
The Tech Report reports. These first 45nm prototypes were produced at Intel's D1D facility in Oregon.
In addition to the 45nm die shrink, Penryn is expected to introduce a couple more manufacturing process changes. These changes include shifting away from Silicon Dioxide gate dielectrics to High-k dielectrics. The gate electrodes will also be revamped with metal gates instead of the Polysilicon derivatives currently used.
Intel is currently ontrack to introduce Penryn core processors in the second half of 2007. As Penryn is currently in its prototype stages Intel’s director of process architecture and integration, Mark Bohr stated: "We are processing the first samples of the Penryn design. These samples will go back to the design team to determine if design is working as expected."
The first 45nm processors from Intel can be expected in retail stores by the time that AMD launches its first 65nm CPUs.
