Posted on Friday, June 22 2007 @ 0:50 CEST by Thomas De Maesschalck
Chinese press
reports the new fab Intel is building in China will use either 65nm or 45nm process technology:
According to a report in China Daily, Intel will introduce 65 nanometre or 45 nanometre process technology in its Dalian fab by 2010.
And, said his worship Xia Deren, Intel will also create an R&D centre at Dalian too.
According to the report, Intel will complete the fab in 2010 by which time it will churn out tens of thousands of chipsets.
