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Micron gets ready for sub-25nm NAND technology

Posted on Wednesday, March 03 2010 @ 00:05:21 CET by

DigiTimes writes Micron is gearing up to advance its NAND flash process technology to sub-25nm nodes in 2011.
Micron Technology is set to advance its NAND flash process technology to sub-25nm nodes in 2011, and is gearing up the development of NAND memory supporting ONFI's soon-to-be available specification called EZ-NAND, according to Kevin Kilbuck, director of NAND market development for Micron.

According to Micron's NAND flash process roadmap, the company expects to enter the sub-25nm technology era in 2011 about one year after mass production of 25nm-made products in mid-2010. The memory maker also looks to develop its charge trap flash (CTF) technology, a replacement option for the current mainstream floating-gate NAND technology.



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