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IBM alliance denies problems with high-k

Posted on Thursday, September 30 2010 @ 04:07:25 CEST by

EE Times reports members of IBM's technology alliance, namely GlobalFoundries and Samsung, dismissed a report that the group is struggling with its high-k/metal gate gate technology:
Members of IBM Corp.'s technology alliance, namely GlobalFoundries Inc. and Samsung Electronics Co. Ltd., dismissed a report that the group is struggling with its high-k/metal-gate technology.

High-k/metal-gate ''technology enables traditional scaling of the electrical gate dielectric and reduced standby power of transistor due to a reduction in gate leakage,''said Andrew Lu, an analyst with Barclays Bank, in a report..



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