There's some good news for the rollout of extreme ultraviolet (EUV) lithography as ASML demonstrated a 250W EUV light source at Semicon West. Chip makers like Intel, Samsung, TSMC, and GlobalFoundries have long insisted that 250W is absolutely required to achieve production of 125 wafers per hour.
It took a lot more years and a lot more money to reach this milestone and now the company is close to shipping the 250W EUV source.
Michael Lercel, director of strategic marketing at ASML, said the company has demonstrated 250 watts “rather consistently by really understanding the conversion efficiency in the source and putting the right controls in place.” He said the source that has demonstrated 250 watts has not yet shipped.
Leading edge chipmakers including Intel, Samsung, TSMC and Globalfoundries are planning to insert EUV into high-volume production sometime in the next two years. ASML demonstrated back in February throughput of 104 WPH and executives said even before the 250 watt source power was demonstrated that the company had a roadmap to get to 125 WPH.
More details at EE Times. The site notes EUV was originally meant to be in production early this decade. Analysts estimate the semiconductor industry has spent more than $20 billion to develop EUV technology. A switch to EUV is needed in the very near future as the currently used immersion lithography is hitting the limits of what's possible.