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Samsung 5nm EUV gets a step closer

Posted on Tuesday, July 09 2019 @ 11:05:23 CEST by


Samsung logo
AnandTech reports Samsung's Foundry unit has certified full flow tools from Cadence and Synopsys for its 5LPE (5nm low-power early) EUV process technology. This brings the production of the first 5nm EUV chips a step closer. For Samsung foundry clients, one of the interesting aspects of this node is that it will be relatively easy to migrate from 7LPP:
Samsung’s 5LPE technology relies on FinFET transistors with a new standard cell architecture and uses both DUV and EUV step-and-scan systems. The new fabrication process enables chip designers to reuse 7LPP IP on ICs designed for 5LPE while enjoying all benefits the latter provides. When compared to 7LPP, the new technology has an up to 25% higher ‘logic efficiency’, it also enables chip developers to reduce power consumption of their designs by 20% or improve their performance by 10%.
Volume production of 5nm EUV chips at Samsung's Hwaseong fab is expected in 2020.



 



 

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