[SMIC co-CEO] Dr. Liang confirmed that the N+1 7 nm node and its immediate successor will not use EUV lithography. N+1 will receive a refinement in the form of N+2, with modest chip power consumption improvement goals compared to N+1. This is similar to SMIC's 12 nm FinFET node being a refinement of its 14 nm FinFET node. Later down its lifecycle, once the company has got a handle of its EUV lithography equipment, N+2 could receive various photomasks, including a switch to EUV at scale.SMIC introduced its 14nm process in 2019. We don't know exactly how SMIC's 7nm node compares to what's offered by TSMC, world's largest foundry. SMIC is still behind its larger rivals but seems to be closing the gap.
Via: TPU