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At IEDM 2008, the focus of the process technology session was the industry-wide transition to 32nm. There were five different papers on 32nm processes and every one relied on high-k dielectrics and metal gates to increase control over the channel and decrease leakage.

The transition to high-k/metal gates was quite challenging for the industry and accelerated the consolidation of digital logic manufacturers. The 45nm process was a turning point for several former stalwarts that ultimately chose to cease internal development of new process technologies.