ASML Holding NV (ASML) today announced that it has entered into a license agreement with Intel Corporation for several lithography patents that can be used to design or produce advanced masks.
“ASML is proud to have the world’s leading chip maker gain rights to some of our patent portfolio. As a company, ASML is committed to developing new innovations to help customers extend the capability of their lithography systems,” said Eric Meurice, president and CEO, ASML.
The licensing agreement includes ASML’s Scattering Bar Technology, which enhances the performance and value of ASML lithography systems by increasing the manufacturing process window and, thereby, contributing to higher yields or more useable chips per wafer.
“Twenty of the world’s leading chip makers and foundries have adopted our Scattering Bar Technology,” said Dinesh Bettadapur, president and CEO, ASML MaskTools. “The need for integrated solutions as offered by ASML to enhance the performance of lithography systems will continue to grow as customers demand ever-smaller feature sizes.”
