Hobbs also pointed out that two fab building projects have been announced in the United States that will be "450-mm compatible." When asked what that meant he said: "Size could be significant, room height and weight-bearing capacity of the floor."More info at EE Times.
With Intel due to start production of chips at 22-nm in 2011, the 10-nm is only two further nodes away. And according to Hobbs, extreme ultraviolet (EUV) lithography is not expected much before 450-mm wafers.
Hobbs was asked when EUV lithography would arrive, to which he responded: "The question is if we see EUV kicking in. It is hugely expensive. It's one or two generations away yet."
Intel sees 10nm as ideal point for 450mm adoption
Posted on Wednesday, March 02 2011 @ 4:20 CET by Thomas De Maesschalck