To make smaller chips better lithography techniques are needed. That's why Intel today said it's given $20 million spread over three yars to Cymer Corp which develops Extreme Ultraviolet (EUV) technology.
Intel's lithography capital equipment development director said that moving EUV technology further along will let it implement 32 nanometre technology in 2009.
Peter Silverman said that's a critical mission at Intel, which wants a cost effective commercial EUV technique to produce development tools by 2006.
In the article linked at the bottom of this article, technology chieftain Sunlil Chou explained tht Intel had great hopes for EUV. But he said then that might not become a reality until 2007.