Intel still needs to do quite a lot of work on the 22nm process and Rattner says that either at 22nm or probably at 16nm the firm will start using tri-gate transistors:
“The jury is still out at 22nm and beyond,” he said. “As to whether we’ll continue with traditional transistors, or whether we’ll move to a surface device such as tri-gate transistors that we’ve been talking about now for at least the last four or five years.”More info over here.
Rattner added that it’s a decision Intel is going to face at at either 22nm or probably at 16nm. “It’s a very important transition—it’s as important as high-k metal gate—because once you’re on the surface you’re going to have a much wider choice of materials. And you can build conventional CMOS devices with tri-gate transistors, which are essentially just better CMOS transistors.”
“It’s sometime in that next decade [after the transition to surface CMOS technology] around the time when we’re making 10nm devices that we want to start looking at other quantum properties,” said Rattner. “Historically, we’ve not been able to look more than a decade out and it takes around a decade to perfect the use of these new materials. For example, our work in high-k started about a decade ago and that’s a good measure for how long these technology advancements take.”