DV Hardware bringing you the hottest news about processors, graphics cards, Intel, AMD, NVIDIA, hardware and technology!

   Home | News submit | News Archives | Reviews | Articles | Howto's | Advertise
 
DarkVision Hardware - Daily tech news
December 3, 2016 
Main Menu
Home
Info
News archives
Articles
Howto
Reviews
 

Who's Online
There are currently 57 people online.

 

Latest Reviews
Zowie P-TF Rough mousepad
Zowie FK mouse
BitFenix Ronin case
Ozone Rage ST headset
Lamptron FC-10 SE fan controller
ZOWIE G-TF Rough mousepad
ROCCAT Isku FX gaming keyboard
Prolimatech Magnetic Pin
 

Follow us
RSS
 

Toshiba makes breakthrough for future development of 16nm chips

Posted on Friday, June 19 2009 @ 02:56:59 CEST by


Toshiba researchers have made a breakthrough which could have significance for future development of chips at 16nm processes.
Toshiba said it has overcome the challenge of fabricating a thin gate stack while maintaining high hole mobility, by inserting SrGex, a compound of strontium (Sr) and germanium, as an interlayer between the high-k insulating layer and the germanium channel.

The technology realises peak hole mobility of 481cm sq./Volt-second.

Toshiba will continue to develop the technology as an option toward implementation of Ge-MISFET to 16nm chips and beyond.
More info at Electronics Weekly.


 



 

DV Hardware - Privacy statement
All logos and trademarks are property of their respective owner.
The comments are property of their posters, all the rest © 2002-2016 DM Media Group bvba