The device features a die size of 158.4mm2. It utilizes a modified source-bias-negative-sense scheme, allowing for deep negative threshold voltage while maintaining a low supply voltage, according to Noboru Shibata, a Toshiba design engineer who presented the paper at ISSCC. The paper was authored by Shibata and a group of engineers from Toshiba and Western Digital.More details at EE Times.
Toshiba presents 96-layer QLC chip with highest density ever
Posted on Wednesday, February 20 2019 @ 12:32 CET by Thomas De Maesschalck